Intelligent optical characterization for nano-manufacturing
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High-performance and noninvasive nanoscale metrology and inspection play a significant role in many areas of nanotechnologies, e.g., in-line process control for high-volume electronic manufacturing, real-time biomedical detection, and in-situ material characterization for scientific research, among others. Optical measurement techniques can characterize nanostructures and detect nanoscale defects in a more efficient and non-destructive manner. Moreover, it can measure complex multi-layer and buried structures as well as reconstruct multiple parameters simultaneously. These optical instruments integrate opto-mechatronic design, physical modeling, computational imaging, and machine learning to achieve high-speed, high precision, and smart measurement. Our research and development address several themes. They are, but not limited to:
1) High precision optical metrology instrumentation
2) Computational electromagnetics for nanoscale structure modeling
3) High-performance signal processing
4) Intelligent computation for the optical inverse problem
5) Novel optical component design
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6) Super-resolution imaging
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Publications
2019
Unevenly spaced continuous measurement approach for dual rotating--retarder Mueller matrix ellipsometry Journal Article
In: Opt. Express, vol. 27, no. 10, pp. 14736–14753, 2019, ISSN: 1094-4087.