Intelligent optical characterization for nano-manufacturing

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  2. High-performance and noninvasive nanoscale metrology and inspection play a significant role in many areas of nanotechnologies, e.g., in-line process control for high-volume electronic manufacturing, real-time biomedical detection, and in-situ material characterization for scientific research, among others. Optical measurement techniques can characterize nanostructures and detect nanoscale defects in a more efficient and non-destructive manner. Moreover, it can measure complex multi-layer and buried structures as well as reconstruct multiple parameters simultaneously. These optical instruments integrate opto-mechatronic design, physical modeling, computational imaging, and machine learning to achieve high-speed, high precision, and smart measurement. Our research and development address several themes. They are, but not limited to:

    1) High precision optical metrology instrumentation

    2) Computational electromagnetics for nanoscale structure modeling

    3) High-performance signal processing

    4) Intelligent computation for the optical inverse problem

    5) Novel optical component design

  3. 6) Super-resolution imaging 


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Publications

2019

1.Unevenly spaced continuous measurement approach for dual rotating--retarder Mueller matrix ellipsometry

Kai Meng; Bo Jiang; Christos D Samolis; Mohamad Alrished; Kamal Youcef-Toumi

Unevenly spaced continuous measurement approach for dual rotating--retarder Mueller matrix ellipsometry Journal Article

Opt. Express, 27 (10), pp. 14736–14753, 2019, ISSN: 1094-4087.

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